DiamFab provide you bare die device ready diamond. On a well selected substrate, the desired layers of diamond are grown by Plasma enhanced CVD. Our products are electronic grade and are ready for devices fabrications. A stack of several layer with different doping levels is also possible.
- Doping level from 1015 cm-3 to 1021 cm-3 (from insulator to metallic conduction)
- Thickness from few nanometers to few tens of micrometers
- Customized layer design and stack
- Low roughness
- Size of 4×4 mm2 or more depending of substrate availability
Combined to our crystaline growth activity, a consulting activity in layer design is also proposed. Thanks to our knowledge in growth and simulation we are able to advise you on the best layer design to optimise your device performances.